Sputtering
Teledyne MEC has two thin-/thick-film sputtering systems (RF and DC)
with 12 in
x 12 in work support areas. In-house targets presently available include:
- Zirconium
- Hafnium
- Tungsten
Residual Gas Analysis equipment is used to ensure the quality
of the process.
Metalizing

Teledyne MEC has alumina ceramic thick film metalizing capability - utilizing
a moly/manganese paint.
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